Low-Carbon Nanoimprint Technology for Pure Silica Glass Micro–Nano Structures 

This project revolutionizes silica glass micro-nano fabrication by replacing energy-intensive, costly, polymer-dependent methods such as femtosecond laser writing and reactive ion etching with a novel nanoimprint lithography (NIL) process. Using a proprietary polymer-free precursor, we achieve low-temperature sintering, which eliminates carbon residues and significantly reducing energy consumption. It produces high-purity silica glass structures with superior optical performance, suitable for large-area, scalable production manufacturing. The technology is well suited for diffractive optics, photonic crystals, and micro-lens arrays, addressing market needs for high performance, low cost, and sustainable manufacturing in the photonics and optoelectronics industries.