EE3801 - Microsystems and Nanotechnology | ||||||||||||
| ||||||||||||
| * The offering term is subject to change without prior notice | ||||||||||||
Course Aims | ||||||||||||
The aim of the course is to provide students with the basic theoretical knowledge, analytical skills and laboratory experience for understanding the nanofabrication technologies for producing microelectronic circuits and microsystems. Highlighted topics include patterning, etching, deposition and doping technologies for nanostructures, devices, and microsystems. | ||||||||||||
Assessment (Indicative only, please check the detailed course information) | ||||||||||||
Continuous Assessment: 60% | ||||||||||||
Examination: 40% | ||||||||||||
Examination Duration: 2 hours | ||||||||||||
Remark: To pass the course, students are required to achieve at least 30% in course work and 30% in the examination. Also, 100% laboratory attendance rate must be obtained. | ||||||||||||
Detailed Course Information | ||||||||||||
| EE3801.pdf | ||||||||||||
Useful Links | ||||||||||||
| Department of Electrical Engineering | ||||||||||||
