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Nano Fabrication Workshop
Objective
Current and future nanofabrication challenges require controlled and reproducible fabrication of nano-structured materials. The increasing demand for ever-smaller feature sizes and reliable fabrication processes for the semiconductor, telecommunications and biomedical R&D sectors are driving the development of innovative manufacturing concepts.
Electron and ion beam lithography, are key cornerstone technologies to help realize complex 1D - to 3D nanostructures, with high resolution which can be gainfully combined with bottom-up methods for novel engineering and characterization techniques.
The development of effective nanofabrication tools and processes are seen as the path to future advancement of nano-metric components and devices, thus enabling novel breakthroughs in inventive R&D projects.
The aim of the workshop is to identify how pioneering nanofabrication schemes enable innovative R&D projects. The workshop will be held parallel with the conference and all are welcomed to attend the workshop.
Presentation Titles
1. Complex Self-Assembled Structures Guided by Sparse Physical Nanotemplates
2. Fabrication of opto-electronic nanodevices with Electron Beam Lithography
3. Innovative Nanofabrication Scheme for High-Performance Devices with Zero Stitching Error
Location: LT17 Time: 14:00 ~ 15:00, Jan 5 2010
Speakers Introduction
Prof. Karl K. Berggren -- Department of Electrical Engineering and Computer Science, Research Laboratory of Electronics (RLE), Massachusetts Institute of Technology (MIT)
Prof. Fuhua Yang -- Director of Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, CAS, Beijing
Andre Linden -- Raith Asia Ltd.
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