Facilities
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Synthesis and Device Fabrication |
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1500¢XC High Vacuum 3 Zone Tube Furnace |
1700¢XC Low Vacuum Single Zone Tube Furnace | |
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ASTEX ECR Microwave Plasma CVD Chambers 1.5kW |
ASTEX ECR Microwave Plasma CVD Chambers 1.5kW | |
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ASTEX ECR Microwave Plasma CVD Chambers 5kW |
Photolithography System in Clean Room, Class 100 | |
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ULVAC Multi-chambers Deposition System in Clean Room, Class 1,000 |
Dual Ion Beam Deposition | |
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UHV Thermal Evaporation System 1 |
Hot Filament CVD System | |
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UHV Magnetron Sputtering System |
UHV Magnetron Sputtering System | |
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Multi-Source Thermal Deposition System |
RF Plasma-assisted hot filament CVD System | |
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UHV Thermal Evaporation System 2 |
UHV Thermal Evaporation System 3 | |
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UHV Electron Beam Deposition System |
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| Characterization | ||
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Philips FEG TEM CM200 |
Nano Indenter XP |
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Omicron (Low Temp.) UHV Multiprobe XP, SPM |
Philips FEG SEM XL30 |
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Photoluminescence Spectroscopy |
Reishaw Raman Spectroscopy 2000 |
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Time Resolve Photoluminescent Spectroscopy |
VG ESCALAB 220i-XL |
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