Facilities


 

Synthesis and Device Fabrication

1500¢XC High Vacuum 3 Zone Tube Furnace

1700¢XC Low Vacuum Single Zone Tube Furnace

1500¢XC High Vacuum 3 Zone Tube Furnace

 

1700¢XC Low Vacuum Single Zone Tube Furnace

 

ASTEX ECR Microwave Plasma CVD Chambers 1.5kW

ASTEX ECR Microwave Plasma CVD Chambers 1.5kW

 

ASTEX ECR Microwave Plasma CVD Chambers 5kW

Photolithography System in Clean Room, Class 100

 

ULVAC Multi-chambers Deposition System in Clean Room, Class 1,000

Dual Ion Beam Deposition

ULVAC Multi-chambers Deposition System in Clean Room, Class 1,000

 

UHV Thermal Evaporation System 1

Hot Filament CVD System

 

 

UHV Magnetron Sputtering System

UHV Magnetron Sputtering System

 

Multi-Source Thermal Deposition System

RF Plasma-assisted hot filament CVD System

 

 

UHV Thermal Evaporation System 2

UHV Thermal Evaporation System 3

 

 

 

UHV Electron Beam Deposition System

Characterization

Philips FEG TEM CM200

Nano Indenter XP

 

 

Omicron (Low Temp.) UHV Multiprobe XP, SPM

Philips FEG SEM XL30

 

 

Photoluminescence Spectroscopy

Reishaw Raman Spectroscopy 2000

 

 

Time Resolve Photoluminescent Spectroscopy

VG ESCALAB 220i-XL