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Facilities

Synthesis and Device Fabrication

1500XC High Vacuum 3 Zone Tube Furnace
1500XC High Vacuum 3 Zone Tube Furnace 		  1700XC Low Vacuum Single Zone Tube Furnace
1700XC Low Vacuum Single Zone Tube Furnace

Photolithography System in Clean Room, Class 100
Photolithography System in Clean Room, Class 100 		  ULVAC Multi-chambers Deposition System in Clean Room, Class 1,000
ULVAC Multi-chambers Deposition System in Clean Room, Class 1,000

ASTEX ECR Microwave Plasma CVD Chambers 1.5kW
ASTEX ECR Microwave Plasma CVD Chambers 1.5kW 		  ASTEX ECR Microwave Plasma CVD Chambers 5kW
ASTEX ECR Microwave Plasma CVD Chambers 5kW

1700XC Low Vacuum Single Zone Tube Furnace
1700XC Low Vacuum Single Zone Tube Furnace 		  Dual Ion Beam Deposition
Dual Ion Beam Deposition

UHV Thermal Evaporation System 1
UHV Thermal Evaporation System 1 		  Hot Filament CVD System
Hot Filament CVD System

UHV Magnetron Sputtering System
UHV Magnetron Sputtering System 		  UHV Magnetron Sputtering System
UHV Magnetron Sputtering System

Multi-Source Thermal Deposition System
Multi-Source Thermal Deposition System 		  RF Plasma-assisted hot filament CVD System
RF Plasma-assisted hot filament CVD System

UHV Thermal Evaporation System 2
UHV Thermal Evaporation System 2 		  UHV Thermal Evaporation System 3
UHV Thermal Evaporation System 3

UHV Electron Beam Deposition System
UHV Electron Beam Deposition System 		   

Characterization

Philips FEG TEM CM200
Philips FEG TEM CM200 		  Nano Indenter XP
Nano Indenter XP

Omicron (Low Temp.) UHV Multiprobe XP, SPM
Omicron (Low Temp.) UHV Multiprobe XP, SPM 		  Philips FEG SEM XL30
Philips FEG SEM XL30

Photoluminescence Spectroscopy
Photoluminescence Spectroscopy 		  Reishaw Raman Spectroscopy 2000
Reishaw Raman Spectroscopy 2000

Time Resolve Photoluminescent Spectroscopy
Time Resolve Photoluminescent Spectroscopy 		  VG ESCALAB 220i-XL
VG ESCALAB 220i-XL